Silicon Planar Process
Fabrication method using silicon dioxide masking and surface passivation to make reliable, mass-producible silicon devices.
Core metadata
- ID: silicon_planar_process
- Era: Modern
- First known date: 1959 (exact)
- Region: United States / Fairchild Semiconductor
- Review status: source_checked
- Maturity: established
Prerequisites
Dependents
Fields
Field lanes
- Semiconductors & Integrated Circuits: Fabrication & Lithography
Node sources
- 1959: Invention of the Planar Manufacturing Process (Computer History Museum, 1959, museum) • Supports: node, maturity
Prerequisite edge evidence
Edge/source evidence summary:
- Prerequisite edges: 2
- Average edge confidence: 82%
- Prerequisite sources: 2
- expert_inference: 2
| Prerequisite | Type | Confidence | Evidence level | Note | Sources |
|---|---|---|---|---|---|
| Semiconductor Devices (semiconductor_devices) | required | 82% | expert_inference | Semiconductors is modeled as a necessary component or method for this technology in the current graph. |
|
| Photolithography (photolithography) | required | 82% | expert_inference | Photolithography is modeled as a necessary component or method for this technology in the current graph. |
|
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