Plasma Etching

Dry etching process that uses reactive plasmas to remove selected thin-film materials in microfabrication.

Core metadata

ID: plasma_etching
Era: Modern
First known date: 1955 (decade)
Region: Global / multiple regions
Review status: source_checked
Maturity: established

Prerequisites

Dependents

Through-Silicon Vias (through_silicon_vias)

Fields

Semiconductors & Integrated Circuits

Field lanes

Semiconductors & Integrated Circuits: Fabrication & Lithography

Node sources

The Silicon Engine (Computer History Museum, 2007, museum) • Supports: node, maturity

Prerequisite edge evidence

Edge/source evidence summary:

Prerequisite edges: 2
Average edge confidence: 75%
Prerequisite sources: 2
expert_inference: 2

Prerequisite	Type	Confidence	Evidence level	Note	Sources
Photolithography (photolithography)	required	82%	expert_inference	Photolithography is modeled as a necessary component or method for this technology in the current graph.	The Silicon Engine (Computer History Museum, 2007, museum) • Supports: node, maturity, edge
Plasma Physics (plasma_physics)	enabling	68%	expert_inference	Plasma Physics provides a capability that enables this technology without being the only possible path.	The Silicon Engine (Computer History Museum, 2007, museum) • Supports: node, maturity, edge

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